Heating configuration for use in thermal processing chambers

An apparatus for heat treating semiconductor wafers is disclosed. The apparatus includes a heating device which contains an assembly linear lamps for emitting light energy onto a wafer. The linear lamps can be placed in various configurations. In accordance with the present invention, tuning devices...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Koren, Zion, O'Carroll, Conor Patrick, Choy, Shuen Chun, Timans, Paul Janis, Cardema, Rudy Santo Tomas, Taoka, James Tsuneo, Strod, Arieh A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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