Overlay and CD process window structure

The present invention provides photolithographic device and method for optimizing the photolithography process window. The photolithography device comprises a substrate; and a pattern layer having radiant energy transparent portions and radiant energy blocking portions, where the pattern layer has f...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Mellinger, Daniel J, Milmore, Timothy C, Nicholls, Matthew C
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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