Self-limited metal recess for deep trench metal fill
Disclosed is a method of manufacturing a deep trench capacitor structure that forms a trench in a substrate, lines the trench with a polysilicon liner, and forms titanium nitride columns along the polysilicon liner. The method etches the titanium nitride columns using chlorine-based dry chemistry th...
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| Format: | Patent |
| Sprache: | eng |
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