Underlayer compositions for multilayer lithographic processes

Compositions suitable for forming planarizing underlayers for multilayer lithographic processes are characterized by the presence of (A) a polymer containing: (i) cyclic ether moieties, (ii) saturated polycyclic moieties, and (iii) aromatic moieties for compositions not requiring a separate crosslin...

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Bibliographische Detailangaben

Hauptverfasser:	Khojasteh, Mahmoud M, Hughes, Timothy M, Kwong, Ranee W, Varanasi, Pushkara Rao, Brunsvold, William R, Lawson, Margaret C, Allen, Robert D, Medeiros, David R, Sooriyakumaran, Ratnam, Brock, Phillip
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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