Deposition chamber and method for depositing low dielectric constant films

One of the primary steps in the fabrication of modem semiconductor devices is the formation of a thin film on a semiconductor substrate by chemical reaction of gases. Such a deposition process is referred to as chemical vapor deposition (CVD). Conventional thermal CVD processes supply reactive gases...

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Bibliographische Detailangaben

Hauptverfasser:	Li, Shijian, Wang, Yaxin, Redeker, Fred C, Ishikawa, Tetsuya, Collins, Alan W
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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