Substrate processing pallet and related substrate processing method and machine
The invention generally relates to pallets adapted for holding one or more substrates during processing. More particularly, in one embodiment, the invention is directed to substrate processing pallets adapted to maintain an aligned position during substrate processing and methods and machines employ...
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creator | Klein, Martin P Felsenthal, David Sferlazzo, Piero |
description | The invention generally relates to pallets adapted for holding one or more substrates during processing. More particularly, in one embodiment, the invention is directed to substrate processing pallets adapted to maintain an aligned position during substrate processing and methods and machines employing such substrate processing pallets.
A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport. |
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A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.</description><language>eng</language><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6821912$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,778,800,883,64020</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6821912$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Klein, Martin P</creatorcontrib><creatorcontrib>Felsenthal, David</creatorcontrib><creatorcontrib>Sferlazzo, Piero</creatorcontrib><creatorcontrib>NEXX Systems Packaging, LLC</creatorcontrib><title>Substrate processing pallet and related substrate processing method and machine</title><description>The invention generally relates to pallets adapted for holding one or more substrates during processing. More particularly, in one embodiment, the invention is directed to substrate processing pallets adapted to maintain an aligned position during substrate processing and methods and machines employing such substrate processing pallets.
A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZPAPLk0qLilKLElVKCjKT04tLs7MS1coSMzJSS1RSMxLUShKzQFKpigUY1OXm1qSkZ8CVpebmJyRmZfKw8CalphTnMoLpbkZFNxcQ5w9dEuLC4Ca80qK49OLEkGUgZmFkaGloZExEUoAcR84cQ</recordid><startdate>20041123</startdate><enddate>20041123</enddate><creator>Klein, Martin P</creator><creator>Felsenthal, David</creator><creator>Sferlazzo, Piero</creator><scope>EFH</scope></search><sort><creationdate>20041123</creationdate><title>Substrate processing pallet and related substrate processing method and machine</title><author>Klein, Martin P ; Felsenthal, David ; Sferlazzo, Piero</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_068219123</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Klein, Martin P</creatorcontrib><creatorcontrib>Felsenthal, David</creatorcontrib><creatorcontrib>Sferlazzo, Piero</creatorcontrib><creatorcontrib>NEXX Systems Packaging, LLC</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Klein, Martin P</au><au>Felsenthal, David</au><au>Sferlazzo, Piero</au><aucorp>NEXX Systems Packaging, LLC</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Substrate processing pallet and related substrate processing method and machine</title><date>2004-11-23</date><risdate>2004</risdate><abstract>The invention generally relates to pallets adapted for holding one or more substrates during processing. More particularly, in one embodiment, the invention is directed to substrate processing pallets adapted to maintain an aligned position during substrate processing and methods and machines employing such substrate processing pallets.
A substrate processing pallet has a top surface and a plurality of side surfaces. The top surface has at least one recess adapted to receive a substrate. The recess includes a support structure adapted to contact a portion of a substrate seated in the recess and a plurality of apertures each adapted to accommodate a lift pin. Lift pins can extend through the apertures initially to support the substrate and retract to deposit the substrate onto the support structure. A side surface includes a process positioning feature adapted to engage with a feature located in a process chamber to position the pallet. A side surface includes a positioning feature adapted to engage with an end effector alignment feature to position the pallet with respect to the end effector during transport. A side surface includes support features adapted to engage with end effector support features to support the pallet during transport.</abstract><oa>free_for_read</oa></addata></record> |
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title | Substrate processing pallet and related substrate processing method and machine |
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