Apparatus for treating substrates

Apparatus for treating substrates

The present invention relates to an apparatus for treating substrates, and includes at least one process container that is disposed in a gas atmosphere, contains a treatment fluid, and has at least two continuously open openings that are disposed below a treatment fluid surface and are provided for...

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Hauptverfasser: Speh, Ulrich, Schneider, Jens, Meuris, Marc
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Sprache:eng
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creator Speh, Ulrich
Schneider, Jens
Meuris, Marc
description The present invention relates to an apparatus for treating substrates, and includes at least one process container that is disposed in a gas atmosphere, contains a treatment fluid, and has at least two continuously open openings that are disposed below a treatment fluid surface and are provided for the linear guidance of the substrates through the container. The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. In addition, an overflow for the treatment fluid is provided.
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The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. 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The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. 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The aim of the invention is to attain a uniform and homogeneous treatment of substrates in a device comprising at least one process container which is arranged in a gas atmosphere and which contains a treatment fluid. Said process container also comprises at least two openings which are located underneath a treatment fluid surface and through which the substrates are linearly guided. In addition, an overflow for the treatment fluid is provided.</abstract><oa>free_for_read</oa></addata></record>
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title Apparatus for treating substrates
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