Photomask and integrated circuit manufactured by automatically correcting design rule violations in a mask layout file

This invention relates in general to the field of photolithography, and more particularly to a photomask and method for eliminating design rule violations from the photomask. A photomask and method for eliminating design rule violations from the photomask are disclosed. A photomask includes a substr...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	Rittman, Dan
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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