Method to avoid striae in EUV lithography mirrors

The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; an...

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Bibliographische Detailangaben

Hauptverfasser:	Best, Michael E, Davis, Jr., Claude L, Edwards, Mary J, Hobbs, Thomas W, Murray, Gregory L
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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