Method to avoid striae in EUV lithography mirrors

Method to avoid striae in EUV lithography mirrors

The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; an...

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Hauptverfasser: Best, Michael E, Davis, Jr., Claude L, Edwards, Mary J, Hobbs, Thomas W, Murray, Gregory L
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Sprache:eng
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creator Best, Michael E
Davis, Jr., Claude L
Edwards, Mary J
Hobbs, Thomas W
Murray, Gregory L
description The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_06776006</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>06776006</sourcerecordid><originalsourceid>FETCH-uspatents_grants_067760063</originalsourceid><addsrcrecordid>eNrjZDD0TS3JyE9RKMlXSCzLz0xRKC4pykxMVcjMU3ANDVPIyQTKphclFmRUKuRmFhXlFxXzMLCmJeYUp_JCaW4GBTfXEGcP3dLigsSS1LyS4nigBhBlYGZubmZgYGZMhBIAPf4sRQ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Method to avoid striae in EUV lithography mirrors</title><source>USPTO Issued Patents</source><creator>Best, Michael E ; Davis, Jr., Claude L ; Edwards, Mary J ; Hobbs, Thomas W ; Murray, Gregory L</creator><creatorcontrib>Best, Michael E ; Davis, Jr., Claude L ; Edwards, Mary J ; Hobbs, Thomas W ; Murray, Gregory L ; Corning Incorporated</creatorcontrib><description>The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.</description><language>eng</language><creationdate>2004</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6776006$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,776,798,881,64012</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6776006$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Best, Michael E</creatorcontrib><creatorcontrib>Davis, Jr., Claude L</creatorcontrib><creatorcontrib>Edwards, Mary J</creatorcontrib><creatorcontrib>Hobbs, Thomas W</creatorcontrib><creatorcontrib>Murray, Gregory L</creatorcontrib><creatorcontrib>Corning Incorporated</creatorcontrib><title>Method to avoid striae in EUV lithography mirrors</title><description>The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2004</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZDD0TS3JyE9RKMlXSCzLz0xRKC4pykxMVcjMU3ANDVPIyQTKphclFmRUKuRmFhXlFxXzMLCmJeYUp_JCaW4GBTfXEGcP3dLigsSS1LyS4nigBhBlYGZubmZgYGZMhBIAPf4sRQ</recordid><startdate>20040817</startdate><enddate>20040817</enddate><creator>Best, Michael E</creator><creator>Davis, Jr., Claude L</creator><creator>Edwards, Mary J</creator><creator>Hobbs, Thomas W</creator><creator>Murray, Gregory L</creator><scope>EFH</scope></search><sort><creationdate>20040817</creationdate><title>Method to avoid striae in EUV lithography mirrors</title><author>Best, Michael E ; Davis, Jr., Claude L ; Edwards, Mary J ; Hobbs, Thomas W ; Murray, Gregory L</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_067760063</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2004</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Best, Michael E</creatorcontrib><creatorcontrib>Davis, Jr., Claude L</creatorcontrib><creatorcontrib>Edwards, Mary J</creatorcontrib><creatorcontrib>Hobbs, Thomas W</creatorcontrib><creatorcontrib>Murray, Gregory L</creatorcontrib><creatorcontrib>Corning Incorporated</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Best, Michael E</au><au>Davis, Jr., Claude L</au><au>Edwards, Mary J</au><au>Hobbs, Thomas W</au><au>Murray, Gregory L</au><aucorp>Corning Incorporated</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Method to avoid striae in EUV lithography mirrors</title><date>2004-08-17</date><risdate>2004</risdate><abstract>The present invention relates to extreme ultraviolet (EUV) mirrors for EUV lithography. More particularly, it relates to methods for manufacturing EUV mirrors. A method for manufacturing an EUV lithography element mirror includes sagging a plate of a glass material to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce a polished EUV mirror. A method for manufacturing an EUV lithography element mirror includes grinding a top face of a piece of a glass material; sagging a plate of the glass material over the top face of the piece to produce an EUV mirror blank; and polishing a top face of the EUV mirror blank to produce an EUV polished mirror.</abstract><oa>free_for_read</oa></addata></record>
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title Method to avoid striae in EUV lithography mirrors
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-04T10%3A59%3A28IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Best,%20Michael%20E&rft.aucorp=Corning%20Incorporated&rft.date=2004-08-17&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E06776006%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true