Semi-aqueous solvent cleaning of paste processing residue from substrates

The present invention relates generally to a new apparatus and method of semi-aqueous solvent cleaning of paste processing residue from substrates. More particularly, the invention encompasses an apparatus and a method that utilizes a semi-aqueous solvent cleaning method for cleaning of paste residu...

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Bibliographische Detailangaben
Hauptverfasser:	Sachdev, Krishna G, Humenik, James N, Lei, Chon Cheong, Pomerantz, Glenn A
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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