Sequential electron induced chemical vapor deposition

1. Field of the Invention Ion-induced, UV-induced, and electron-induced sequential chemical vapor deposition (CVD) processes are disclosed where an ion flux, a flux of ultra-violet radiation, or an electron flux, respectively, is used to induce the chemical reaction in the process. The process for d...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Fair, James A, Taylor, Nerissa
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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