Birefringence minimizing fluoride crystal optical VUV microlithography lens elements and optical blanks

The present invention relates generally to optical lithography elements and blanks, and particularly to optical microlithography crystal lens elements and optical element blanks for use in optical photolithography systems utilizing vacuum ultraviolet light (VUV) wavelengths below 200 nm, preferably...

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Bibliographische Detailangaben

Hauptverfasser:	Meda, Gautam, Rivera, Michael, Price, Michael W
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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