Belt wiper for a chemical mechanical planarization system

Belt wiper for a chemical mechanical planarization system

1. Field of the Invention A belt wiper that can be used in a linear belt-type chemical mechanical planarization (CMP) system to maintain a belt pad is provided. The belt wiper mitigates disturbances within a detection region important to a belt pad steering system. Also, the belt wiper mitigates the...

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Hauptverfasser: Taylor, Travis R, DiPietro, Christian, Jew, Stephen, Ngoon, Philip, Ramanujam, Katgenahalli Y, Luong, Tony
Format: Patent
Sprache:eng
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creator Taylor, Travis R
DiPietro, Christian
Jew, Stephen
Ngoon, Philip
Ramanujam, Katgenahalli Y
Luong, Tony
description 1. Field of the Invention A belt wiper that can be used in a linear belt-type chemical mechanical planarization (CMP) system to maintain a belt pad is provided. The belt wiper mitigates disturbances within a detection region important to a belt pad steering system. Also, the belt wiper mitigates the obscuring of optical components important to operation of an endpoint detection system. Thus, the belt wiper, by wiping the underside of the belt pad will preserve the functionality of both the belt pad steering system and the endpoint detection system.
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Field of the Invention A belt wiper that can be used in a linear belt-type chemical mechanical planarization (CMP) system to maintain a belt pad is provided. The belt wiper mitigates disturbances within a detection region important to a belt pad steering system. Also, the belt wiper mitigates the obscuring of optical components important to operation of an endpoint detection system. Thus, the belt wiper, by wiping the underside of the belt pad will preserve the functionality of both the belt pad steering system and the endpoint detection system.</abstract><oa>free_for_read</oa></addata></record>
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title Belt wiper for a chemical mechanical planarization system
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