Carbon film method for formation thereof and article covered with carbon film and method for preparation thereof

The present invention relates to a carbon film, and particularly relates to a carbon film containing, in addition to carbon, fluorine and hydrogen, a carbon film containing, in addition to carbon, hydrogen and nitrogen, a carbon film containing, in addition to carbon, hydrogen and at least one of metal, metal compound, silicon and silicon compound as well as a method of forming the same, an object coated with a carbon film, and a method of manufacturing the same. A carbon film containing fluorine and hydrogen, wherein a spectrum determined by FT-IR (Fourier Transform Infrared) spectrum analysis exhibits such a relationship that a ratio (IR.C-F)/(IR.C-H) between a peak area (IR.C-F) in a range from 1000 cmresulting from C-F bonds and a peak area (IR.C-H) in a range from 2800 cmto 3100 cmresulting from C-H bonds is larger than 0, and a spectrum determined by XPS (X-ray photoelectron spectrum analysis) exhibits such a relationship that a ratio (F/C) between a peak intensity resulting from Fand a peak intensity resulting from Cis larger than 0 and smaller than 3. A carbon film containing hydrogen and nitrogen. A carbon film containing at least one of metal, metal compound, silicon and silicon compound.