Preparation of diorganodichlorosilane

This invention relates to a process for preparing a diorganodichlorosilane through disproportionation reaction of organochlorosilanes. A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in th...

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Hauptverfasser: Tsukuno, Akihito, Kobayashi, Hiroyuki, Satoh, Yukinori, Ozeki, Hideaki, Shirota, Yoshihiro, Ueno, Susumu
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creator Tsukuno, Akihito
Kobayashi, Hiroyuki
Satoh, Yukinori
Ozeki, Hideaki
Shirota, Yoshihiro
Ueno, Susumu
description This invention relates to a process for preparing a diorganodichlorosilane through disproportionation reaction of organochlorosilanes. A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlClor AlBrand a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlClor the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.
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fullrecord <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_06632956</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>06632956</sourcerecordid><originalsourceid>FETCH-uspatents_grants_066329563</originalsourceid><addsrcrecordid>eNrjZFANKEotSCxKLMnMz1PIT1NIycwvSk_My0_JTM7IyS_KL87MScxL5WFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrAzMzYyNLUzJgIJQBeiCjB</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Preparation of diorganodichlorosilane</title><source>USPTO Issued Patents</source><creator>Tsukuno, Akihito ; Kobayashi, Hiroyuki ; Satoh, Yukinori ; Ozeki, Hideaki ; Shirota, Yoshihiro ; Ueno, Susumu</creator><creatorcontrib>Tsukuno, Akihito ; Kobayashi, Hiroyuki ; Satoh, Yukinori ; Ozeki, Hideaki ; Shirota, Yoshihiro ; Ueno, Susumu ; Shin-Etsu Chemical Co., Ltd</creatorcontrib><description>This invention relates to a process for preparing a diorganodichlorosilane through disproportionation reaction of organochlorosilanes. A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlClor AlBrand a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlClor the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.</description><language>eng</language><creationdate>2003</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6632956$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,777,799,882,64018</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6632956$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Tsukuno, Akihito</creatorcontrib><creatorcontrib>Kobayashi, Hiroyuki</creatorcontrib><creatorcontrib>Satoh, Yukinori</creatorcontrib><creatorcontrib>Ozeki, Hideaki</creatorcontrib><creatorcontrib>Shirota, Yoshihiro</creatorcontrib><creatorcontrib>Ueno, Susumu</creatorcontrib><creatorcontrib>Shin-Etsu Chemical Co., Ltd</creatorcontrib><title>Preparation of diorganodichlorosilane</title><description>This invention relates to a process for preparing a diorganodichlorosilane through disproportionation reaction of organochlorosilanes. A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlClor AlBrand a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlClor the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2003</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZFANKEotSCxKLMnMz1PIT1NIycwvSk_My0_JTM7IyS_KL87MScxL5WFgTUvMKU7lhdLcDApuriHOHrqlxQWJJal5JcXx6UWJIMrAzMzYyNLUzJgIJQBeiCjB</recordid><startdate>20031014</startdate><enddate>20031014</enddate><creator>Tsukuno, Akihito</creator><creator>Kobayashi, Hiroyuki</creator><creator>Satoh, Yukinori</creator><creator>Ozeki, Hideaki</creator><creator>Shirota, Yoshihiro</creator><creator>Ueno, Susumu</creator><scope>EFH</scope></search><sort><creationdate>20031014</creationdate><title>Preparation of diorganodichlorosilane</title><author>Tsukuno, Akihito ; Kobayashi, Hiroyuki ; Satoh, Yukinori ; Ozeki, Hideaki ; Shirota, Yoshihiro ; Ueno, Susumu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_066329563</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2003</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Tsukuno, Akihito</creatorcontrib><creatorcontrib>Kobayashi, Hiroyuki</creatorcontrib><creatorcontrib>Satoh, Yukinori</creatorcontrib><creatorcontrib>Ozeki, Hideaki</creatorcontrib><creatorcontrib>Shirota, Yoshihiro</creatorcontrib><creatorcontrib>Ueno, Susumu</creatorcontrib><creatorcontrib>Shin-Etsu Chemical Co., Ltd</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Tsukuno, Akihito</au><au>Kobayashi, Hiroyuki</au><au>Satoh, Yukinori</au><au>Ozeki, Hideaki</au><au>Shirota, Yoshihiro</au><au>Ueno, Susumu</au><aucorp>Shin-Etsu Chemical Co., Ltd</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Preparation of diorganodichlorosilane</title><date>2003-10-14</date><risdate>2003</risdate><abstract>This invention relates to a process for preparing a diorganodichlorosilane through disproportionation reaction of organochlorosilanes. A diorganodichlorosilane is prepared by subjecting organochlorosilanes to disproportionation reaction in the co-presence of a SiH group-containing compound and in the presence of a primary catalyst of AlClor AlBrand a co-catalyst of Mg, Al, Ca, Ti, Fe, Ni, Cu, Zn or Sn or a compound thereof. The invention enables disproportionation reaction of organochlorosilanes under atmospheric pressure and at a low temperature at which no substantial sublimation of AlClor the like occurs, thus allowing the reaction equipment to be simple and improving the safety of reaction.</abstract><oa>free_for_read</oa></addata></record>
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title Preparation of diorganodichlorosilane
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-19T00%3A09%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Tsukuno,%20Akihito&rft.aucorp=Shin-Etsu%20Chemical%20Co.,%20Ltd&rft.date=2003-10-14&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E06632956%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true