Aluminum hardmask for dielectric etch

Aluminum hardmask for dielectric etch

The invention is generally related to the field of forming semiconductor devices and more specifically to hardmasks for dielectric etches, such as those used in forming copper interconnects. An aluminum hardmask () is used for etching a dielectric layer (). A fluorine-based etch is used that does no...

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creator Brennan, Kenneth D
description The invention is generally related to the field of forming semiconductor devices and more specifically to hardmasks for dielectric etches, such as those used in forming copper interconnects. An aluminum hardmask () is used for etching a dielectric layer (). A fluorine-based etch is used that does not etch the aluminum hardmask (). The aluminum hardmask () is then removed by CMP.
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title Aluminum hardmask for dielectric etch
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