Method and apparatus for cleaning a semiconductor wafer processing system

1. Field of Invention A method and apparatus for cleaning a semiconductor wafer processing system comprising a turbomolecular pump. In one embodiment, the invention may be reduced to practice by first supplying a cleaning agent to a chamber; pumping the cleaning agent from the chamber through an the...

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Bibliographische Detailangaben

Hauptverfasser:	Kwan, Michael Chiu, Collins, Alan W, Hamila, Jalel, Krishnaraj, Padmanabhan, Tan, Zhengquan
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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