Microelectronic fabrication having microelectronic capacitor structure fabricated therein
1. Field of the Invention Within a method for fabricating a microelectronic fabrication, and the microelectronic fabrication fabricated employing the method, there is formed within the microelectronic fabrication a capacitor structure upon a conductor stud layer formed into a first via defined by a...
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| Format: | Patent |
| Sprache: | eng |
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