Optical system for crystallization tool

The present invention relates to an optical system for crystallization tool, more particularly, to an optical system for crystallization tool for crystallizing an amorphous silicon thin film by using an excimer laser as an exposure light source through a fine-stripped pattern. The present invention...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lee, Kag Hyeon, Kim, Doh Hoon, Choi, Sang Soo, Chung, Hai Bin, Kim, Dae Yong
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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