Pulsed X-ray reflectometer

The present invention relates generally to analytical instruments, and specifically to instruments and methods for thin film analysis using X-rays. Reflectometry apparatus includes a pulsed X-ray source, adapted to irradiate a sample with a sequence of pulses of radiation over a range of angles rela...

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Bibliographische Detailangaben
1. Verfasser: Yokhin, Boris
Format: Patent
Sprache:eng
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Beschreibung
Zusammenfassung:The present invention relates generally to analytical instruments, and specifically to instruments and methods for thin film analysis using X-rays. Reflectometry apparatus includes a pulsed X-ray source, adapted to irradiate a sample with a sequence of pulses of radiation over a range of angles relative to a surface of the sample. An array of detector elements is positioned to receive the radiation reflected from the sample over the range of angles and to generate a signal indicative of respective charges accumulated by the detector elements due to photons of the radiation that are incident on the elements. Timing circuitry is coupled to the array so as to cause the charges to be cleared from the detector elements immediately before each of the pulses in the sequence, and to cause the signal from the elements to be sampled shortly after each of the pulses.