Heater patterns for planar gas sensors
This disclosure relates to planar gas sensors, and, more particularly, to heater patterns for planar gas sensors that yield a reduction in the incidence of cracking attributable to tensile stresses at the edges of the planar gas sensors. A heater pattern for a heater of a gas sensor in which a tempe...
Gespeichert in:
Hauptverfasser: | , , |
---|---|
Format: | Patent |
Sprache: | eng |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | |
---|---|
container_issue | |
container_start_page | |
container_title | |
container_volume | |
creator | Kikuchi, Paul C Tai, Lone-Wen F Symons, Walter T |
description | This disclosure relates to planar gas sensors, and, more particularly, to heater patterns for planar gas sensors that yield a reduction in the incidence of cracking attributable to tensile stresses at the edges of the planar gas sensors.
A heater pattern for a heater of a gas sensor in which a temperature profile is manipulated utilizes a thermistor element arranged in an electrically serial configuration and disposed on a substrate. The thermistor element is arranged so as to define an edge pattern extending about a perimeter of the substrate and a center pattern serially connected to the edge pattern. The center pattern extends over a portion of the substrate that is intermediate the perimeter of the substrate. In a preferred embodiment, the thermistor element is screen printed onto the substrate to a thickness of about 5 microns to about 50 microns, and preferably to a thickness of about 10 microns to about 40 microns. The edge and center patterns are furthermore preferably formed of materials having differing coefficients of thermal resistivity, e.g., platinum and platinum/palladium blends. A method of heating the gas sensor includes disposing the thermistor element in an electrically serial configuration about a perimeter of the substrate and over a portion of the substrate intermediate the perimeter of the substrate and pass an electric current through the thermistor element. |
format | Patent |
fullrecord | <record><control><sourceid>uspatents_EFH</sourceid><recordid>TN_cdi_uspatents_grants_06435005</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>06435005</sourcerecordid><originalsourceid>FETCH-uspatents_grants_064350053</originalsourceid><addsrcrecordid>eNrjZFDzSE0sSS1SKEgsAVJ5xQpp-UBOTmJeYpFCemKxQnFqXnF-UTEPA2taYk5xKi-U5mZQcHMNcfbQLS0G6kzNKymOTy9KBFEGZibGpgYGpsZEKAEASOooYA</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>Heater patterns for planar gas sensors</title><source>USPTO Issued Patents</source><creator>Kikuchi, Paul C ; Tai, Lone-Wen F ; Symons, Walter T</creator><creatorcontrib>Kikuchi, Paul C ; Tai, Lone-Wen F ; Symons, Walter T ; Delphi Technologies, Inc</creatorcontrib><description>This disclosure relates to planar gas sensors, and, more particularly, to heater patterns for planar gas sensors that yield a reduction in the incidence of cracking attributable to tensile stresses at the edges of the planar gas sensors.
A heater pattern for a heater of a gas sensor in which a temperature profile is manipulated utilizes a thermistor element arranged in an electrically serial configuration and disposed on a substrate. The thermistor element is arranged so as to define an edge pattern extending about a perimeter of the substrate and a center pattern serially connected to the edge pattern. The center pattern extends over a portion of the substrate that is intermediate the perimeter of the substrate. In a preferred embodiment, the thermistor element is screen printed onto the substrate to a thickness of about 5 microns to about 50 microns, and preferably to a thickness of about 10 microns to about 40 microns. The edge and center patterns are furthermore preferably formed of materials having differing coefficients of thermal resistivity, e.g., platinum and platinum/palladium blends. A method of heating the gas sensor includes disposing the thermistor element in an electrically serial configuration about a perimeter of the substrate and over a portion of the substrate intermediate the perimeter of the substrate and pass an electric current through the thermistor element.</description><language>eng</language><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6435005$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,802,885,64039</link.rule.ids><linktorsrc>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/6435005$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Kikuchi, Paul C</creatorcontrib><creatorcontrib>Tai, Lone-Wen F</creatorcontrib><creatorcontrib>Symons, Walter T</creatorcontrib><creatorcontrib>Delphi Technologies, Inc</creatorcontrib><title>Heater patterns for planar gas sensors</title><description>This disclosure relates to planar gas sensors, and, more particularly, to heater patterns for planar gas sensors that yield a reduction in the incidence of cracking attributable to tensile stresses at the edges of the planar gas sensors.
A heater pattern for a heater of a gas sensor in which a temperature profile is manipulated utilizes a thermistor element arranged in an electrically serial configuration and disposed on a substrate. The thermistor element is arranged so as to define an edge pattern extending about a perimeter of the substrate and a center pattern serially connected to the edge pattern. The center pattern extends over a portion of the substrate that is intermediate the perimeter of the substrate. In a preferred embodiment, the thermistor element is screen printed onto the substrate to a thickness of about 5 microns to about 50 microns, and preferably to a thickness of about 10 microns to about 40 microns. The edge and center patterns are furthermore preferably formed of materials having differing coefficients of thermal resistivity, e.g., platinum and platinum/palladium blends. A method of heating the gas sensor includes disposing the thermistor element in an electrically serial configuration about a perimeter of the substrate and over a portion of the substrate intermediate the perimeter of the substrate and pass an electric current through the thermistor element.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EFH</sourceid><recordid>eNrjZFDzSE0sSS1SKEgsAVJ5xQpp-UBOTmJeYpFCemKxQnFqXnF-UTEPA2taYk5xKi-U5mZQcHMNcfbQLS0G6kzNKymOTy9KBFEGZibGpgYGpsZEKAEASOooYA</recordid><startdate>20020820</startdate><enddate>20020820</enddate><creator>Kikuchi, Paul C</creator><creator>Tai, Lone-Wen F</creator><creator>Symons, Walter T</creator><scope>EFH</scope></search><sort><creationdate>20020820</creationdate><title>Heater patterns for planar gas sensors</title><author>Kikuchi, Paul C ; Tai, Lone-Wen F ; Symons, Walter T</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_grants_064350053</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Kikuchi, Paul C</creatorcontrib><creatorcontrib>Tai, Lone-Wen F</creatorcontrib><creatorcontrib>Symons, Walter T</creatorcontrib><creatorcontrib>Delphi Technologies, Inc</creatorcontrib><collection>USPTO Issued Patents</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Kikuchi, Paul C</au><au>Tai, Lone-Wen F</au><au>Symons, Walter T</au><aucorp>Delphi Technologies, Inc</aucorp><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Heater patterns for planar gas sensors</title><date>2002-08-20</date><risdate>2002</risdate><abstract>This disclosure relates to planar gas sensors, and, more particularly, to heater patterns for planar gas sensors that yield a reduction in the incidence of cracking attributable to tensile stresses at the edges of the planar gas sensors.
A heater pattern for a heater of a gas sensor in which a temperature profile is manipulated utilizes a thermistor element arranged in an electrically serial configuration and disposed on a substrate. The thermistor element is arranged so as to define an edge pattern extending about a perimeter of the substrate and a center pattern serially connected to the edge pattern. The center pattern extends over a portion of the substrate that is intermediate the perimeter of the substrate. In a preferred embodiment, the thermistor element is screen printed onto the substrate to a thickness of about 5 microns to about 50 microns, and preferably to a thickness of about 10 microns to about 40 microns. The edge and center patterns are furthermore preferably formed of materials having differing coefficients of thermal resistivity, e.g., platinum and platinum/palladium blends. A method of heating the gas sensor includes disposing the thermistor element in an electrically serial configuration about a perimeter of the substrate and over a portion of the substrate intermediate the perimeter of the substrate and pass an electric current through the thermistor element.</abstract><oa>free_for_read</oa></addata></record> |
fulltext | fulltext_linktorsrc |
identifier | |
ispartof | |
issn | |
language | eng |
recordid | cdi_uspatents_grants_06435005 |
source | USPTO Issued Patents |
title | Heater patterns for planar gas sensors |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-03T11%3A15%3A30IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-uspatents_EFH&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=Kikuchi,%20Paul%20C&rft.aucorp=Delphi%20Technologies,%20Inc&rft.date=2002-08-20&rft_id=info:doi/&rft_dat=%3Cuspatents_EFH%3E06435005%3C/uspatents_EFH%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |