Dual mask process for semiconductor devices

This invention relates to the manufacture of integrated circuit devices on a semiconductor substrate. In particular, the present invention relates to a fabrication process for making a logic device with embedded memory where the memory and logic FETs require only one additional DUV mask to create se...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Liu, Joyce C, Brighten, James C, Brown, Jeffrey J, Golz, John, Kaplita, George A, Mih, Rebecca, Srinivasan, Senthil, Wu, Jin Jwang, Wu, Teresa J, Yu, Chienfan
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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