Method and apparatus for sputter etch conditioning a ceramic body

1. Field of the Invention A method and apparatus for conditioning a surface of a ceramic body in a process chamber when the process chamber has a vacuum pump, an anode and a cathode. The conditioning method consists of pumping the process chamber down to a vacuum with the vacuum pump, introducing a...

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Hauptverfasser:	Khurana, Nitin, Burkhart, Vince, Sansoni, Steve, Parkhe, Vijay, Tzou, Eugene
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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