Methods and compositions for imaging acids in chemically amplified photoresists using pH-dependent fluorophores

The present invention relates to the field of lithography and more specifically relates to the use of chemically amplified photoresists in lithography. A method of imaging acids in chemically amplified photoresists involves exposing to radiation a chemically amplified photoresist comprising a pH-dep...

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Bibliographische Detailangaben

Hauptverfasser:	Grober, Robert David, Bukofsky, Scott Josef, Dentinger, Paul Michael, Taylor, James Welch
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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