Method of cleaning substrate and method of manufacturing semiconductor device
1. Field of the Invention A method of cleaning a substrate is provided which can remove contamination after treatment of a substrate surface by use of chemicals etc. prior to film formation. The method of cleaning the substrate surface uses of a vapor of chlorosulfonic acid (SOCl(OH)).
Gespeichert in:
| Hauptverfasser: | , |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| Zusammenfassung: | 1. Field of the Invention
A method of cleaning a substrate is provided which can remove contamination after treatment of a substrate surface by use of chemicals etc. prior to film formation. The method of cleaning the substrate surface uses of a vapor of chlorosulfonic acid (SOCl(OH)). |
|---|