Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask

A method and apparatus are disclosed for fabricating a substrate having a plurality of circuit patterns. The substrate is exposed to a primary mask having a plurality of the desired circuit patterns, surrounded by one or more exclusion regions, and a secondary mask having a pattern corresponding to...

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Bibliographische Detailangaben

Hauptverfasser:	Waskiewicz, Warren, Farrow, Reginald
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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