Method for cleaning semiconductor manufacturing system

This invention is a method for cleaning a semiconductor manufacturing system, which passes a highly volatile liquid agent through the system to remove the impurities and to dissolve chemicals used in the system. The cleaning agent dissolves and washes the chemicals out of the system to keep the chem...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Lin, Chi-Hui, Chao, Wei-Sheng, Chen, Chuang-I, Chang, Goang-Cheng, Hsieh, Chao-Kai, Huang, Hsin-Cheng, Chu, Cheng-Jye
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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