Convex insert ring for etch chamber

A new and improved insert ring for a wafer support inside a processing chamber for the processing, particularly dry etching, of semiconductor wafer substrates. The insert ring includes a generally convex inner surface which faces the wafer support and defines a gap or berline wall between the insert...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Wang, Ming-Yi, Tsai, Jeng-Yen, Chuang, Jeng-Chiang, Tasi, Chon-Yai
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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