Method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates

The invention relates to a device and to a method for depositing especially crystalline layers from the gas phase onto especially crystalline substrates. The device comprises a heated reaction chamber with a substrate support that receives at least one substrate; one or more heated sources where a g...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Heuken, Michael, Kaeppeler, Johannes, Beccard, Rainer, Strauch, Gerhard
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!