Method for monitoring an ion implanter and ion implanter having a shadow jig for performing the same

A method for monitoring an ion implanter includes positioning a substrate behind an interceptor for intercepting a portion of an ion beam to be irradiated toward the substrate, irradiating a first ion beam toward the substrate to form a first shadow on the substrate, rotating the substrate about a c...

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Bibliographische Detailangaben

Hauptverfasser:	Jun, Chung-Sam, Choi, Sun-Yong, Lee, Dong-Chun, Kim, Tae-Kyoung, Song, Doo-Guen, Chae, Seung-Won
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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