Method for fabricating a pattern and method for manufacturing a semiconductor device

A method for fabricating a pattern, includes: delineating a mask pattern on at least a portion of an underlying layer; etching a portion of the mask pattern; irradiating an incident light on the mask pattern to which the etching is performed and detecting a reflected light produced by reflecting the...

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Bibliographische Detailangaben

Hauptverfasser:	Sakai, Takayuki, Ohiwa, Tokuhisa, Kibe, Masanobu
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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