Method for depositing in particular crystalline layers, gas-admission element and device for carrying out the method

The invention relates to a method and to a device for carrying out the method for depositing, in particular, crystalline layers on substrates that are also, in particular, crystalline. According to the invention, at least two process gases are introduced separate from one another into a process cham...

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Bibliographische Detailangaben

Hauptverfasser:	Reinhold, Markus, Strauch, Gerd
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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