High temperature shape memory alloy thin film

A magnetron sputter deposition process for producing a thin film alloy exhibiting shape memory characteristics comprising conducting the sputter deposition using krypton as process gas, depositing the alloy onto heated substrate so secondary annealing is unnecessary, and using a sputter target titan...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Rasmussen, Gregory, Zhang, Jinping, Chang, Fenglian, Gold, Terry
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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