Method of producing an integrated circuit with a carbon nanotube

A method of producing an integrated circuit with a carbon nanotube is disclosed. The integrated circuit includes a source, a drain, and a gate, and the source and the drain are positioned on the gate. A catalytic material is deposited onto the source. The catalytic material is then subjected to chem...

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1. Verfasser:	Schlaf, Rudiger
Format:	Patent
Sprache:	eng
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creator	Schlaf, Rudiger
description	A method of producing an integrated circuit with a carbon nanotube is disclosed. The integrated circuit includes a source, a drain, and a gate, and the source and the drain are positioned on the gate. A catalytic material is deposited onto the source. The catalytic material is then subjected to chemical vapor deposition. This initiates growth of the carbon nanotube such that the carbon nanotube extends from the source. Next, the carbon nanotube is bent toward the integrated circuit such that the carbon nanotube extends between the source and the drain to render the circuit operable.
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title	Method of producing an integrated circuit with a carbon nanotube
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