Lift-off method and chemical liquid tank

A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which contains a pattern portion to be remov...

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Hauptverfasser: Nitta, Yoshiki, Suzuki, Masaru, Ohmuro, Kazuhiko
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Sprache:eng
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creator Nitta, Yoshiki
Suzuki, Masaru
Ohmuro, Kazuhiko
description A lift-off procedure is provided which enables prevention of damage to a wiring pattern caused by contact of a metal being peeled off from a wafer with a wiring pattern at a time of lift-off procedure. A wafer having a surface on which a pattern is formed which contains a pattern portion to be removed is soaked into a chemical liquid at an angle at which the surface faces downward.
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title Lift-off method and chemical liquid tank
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