Method for fabricating a semiconductor device and a substrate processing apparatus

A semiconductor device fabricating method includes the steps of loading one or more substrates into a boat disposed in a waiting room positioned next to a reaction furnace; vacuum-evacuating the waiting room to a vacuum state at a base pressure; loading the boat into the reaction furnace at a first...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	Suzaki, Kenichi, Ozaki, Takashi, Mizuno, Norikazu
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!