Process chamber components having textured internal surfaces and method of manufacture

Process chamber components having textured internal surfaces and method of manufacture

A domed enclosure wall for a plasma processing chamber is made from a dielectric material having a roughened surface with a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating is applied on the roughened surface of the dielectric material. The plasma spraye...

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Hauptverfasser: Lin, Shyh-Nung, Menzie, Mark, Sommers, Joe, Clawson, Daniel, Mori, Glen, Sharp, Lolita
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Sprache:eng
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creator Lin, Shyh-Nung
Menzie, Mark
Sommers, Joe
Clawson, Daniel
Mori, Glen
Sharp, Lolita
description A domed enclosure wall for a plasma processing chamber is made from a dielectric material having a roughened surface with a roughness average of from about 150 to about 450 microinches. A plasma sprayed ceramic coating is applied on the roughened surface of the dielectric material. The plasma sprayed coating comprises a textured surface having a roughness with an average skewness that is a negative value. When the enclosure wall is used in a plasma processing chamber, sputtered material generated by a plasma formed in a plasma processing chamber has good adherence to the textured surface.
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title Process chamber components having textured internal surfaces and method of manufacture
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