Multi-computer chamber control system, method and medium
A system, method and medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. Some embodiments contemplate that each processor may reside within its own computer proces...
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creator | Goder, Alexey Yam, Mark |
description | A system, method and medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. Some embodiments contemplate that each processor may reside within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system implements specified functions to control and maintain certain parameters involved in the manufacture of the wafer. This allows the present invention to react quickly to maintain rapidly-changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer. |
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Some embodiments contemplate that each processor may reside within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system implements specified functions to control and maintain certain parameters involved in the manufacture of the wafer. This allows the present invention to react quickly to maintain rapidly-changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer.</description><language>eng</language><creationdate>2002</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://image-ppubs.uspto.gov/dirsearch-public/print/downloadPdf/20020183885$$EPDF$$P50$$Guspatents$$Hfree_for_read</linktopdf><link.rule.ids>230,308,780,873,885,64058</link.rule.ids><linktorsrc>$$Uhttps://patentcenter.uspto.gov/applications/10198985$$EView_record_in_USPTO$$FView_record_in_$$GUSPTO$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>Goder, Alexey</creatorcontrib><creatorcontrib>Yam, Mark</creatorcontrib><title>Multi-computer chamber control system, method and medium</title><description>A system, method and medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. Some embodiments contemplate that each processor may reside within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system implements specified functions to control and maintain certain parameters involved in the manufacture of the wafer. This allows the present invention to react quickly to maintain rapidly-changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer.</description><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2002</creationdate><recordtype>patent</recordtype><sourceid>EFI</sourceid><recordid>eNrjZLDwLc0pydRNzs8tKC1JLVJIzkjMTQLR-XklRfk5CsWVxSWpuToKuaklGfkpCol5KUBmSmZpLg8Da1piTnEqL5TmZtB0cw1x9tAtLS5ILEnNKymOTywoyMlMTizJzM8rjjcyMDAyMLQwtrAwNSZFLQChMzV5</recordid><startdate>20021205</startdate><enddate>20021205</enddate><creator>Goder, Alexey</creator><creator>Yam, Mark</creator><scope>EFI</scope></search><sort><creationdate>20021205</creationdate><title>Multi-computer chamber control system, method and medium</title><author>Goder, Alexey ; Yam, Mark</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-uspatents_applications_200201838853</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2002</creationdate><toplevel>online_resources</toplevel><creatorcontrib>Goder, Alexey</creatorcontrib><creatorcontrib>Yam, Mark</creatorcontrib><collection>USPTO Published Applications</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Goder, Alexey</au><au>Yam, Mark</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>Multi-computer chamber control system, method and medium</title><date>2002-12-05</date><risdate>2002</risdate><abstract>A system, method and medium for controlling a wafer processing chamber using two or more processors (within one or more computer processing systems), wherein specified functions are assigned to each processor. Some embodiments contemplate that each processor may reside within its own computer processor system (each computer processor system being in communication with the other), wherein each computer processor system implements specified functions to control and maintain certain parameters involved in the manufacture of the wafer. This allows the present invention to react quickly to maintain rapidly-changing desired conditions within a wafer processing chamber and to maintain a greater degree of uniformity of those conditions throughout the wafer.</abstract><oa>free_for_read</oa></addata></record> |
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recordid | cdi_uspatents_applications_20020183885 |
source | USPTO Published Applications |
title | Multi-computer chamber control system, method and medium |
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