Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus

Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus

An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement va...

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Hauptverfasser: Sugaya, Masakazu, Isshiki, Fumio, Suzuki, Tatsundo, Yomaoka, Masahiro, Hosaka, Sumio
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Sprache:eng
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creator Sugaya, Masakazu
Isshiki, Fumio
Suzuki, Tatsundo
Yomaoka, Masahiro
Hosaka, Sumio
description An absolute accuracy in the range from ±2 nm to ±1 nm for a displacement measurement value is provided by a laser interferometer displacement measuring system. A fluctuating error component that appears corresponding to the wave cycle of laser light is detected and subtracted from the measurement value while a stage is moving, thereby providing a high accuracy.
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title Laser interferometer displacement measuring system, exposure apparatus, and elecron beam lithography apparatus
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