HEATING INSTALLATION FOR A REACTOR

Heating installation for a reactor. The reactor is provided with gas feed openings and gas discharge openings opening into a treatment chamber for accommodating a wafer floating therein. By means of such a treatment a wafer can be heated and cooled relatively rapidly. During the actual treatment it...

Ausführliche Beschreibung

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Bibliographische Detailangaben
1. Verfasser: KUZNETSOV, VLADIMIR IVANOVICH
Format: Patent
Sprache:eng
Online-Zugang:Volltext bestellen
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