Chemical vapor deposition chamber

A semiconductor wafer-processing chamber comprises a substrate support platform having a centrally disposed recess and a substrate support assembly disposed over the centrally disposed recess of the support platform. At least one platform arm extends radially from the substrate support platform to a...

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Bibliographische Detailangaben

Hauptverfasser:	Gujer, Rudolf, Cho, Thomas, Ishikawa, Tetsuya
Format:	Patent
Sprache:	eng
Online-Zugang:	Volltext bestellen
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