PHOTORESIST-REMOVING LIQUID AND PHOTORESIST-REMOVING METHOD
1234 The present invention discloses a photoresist-removing solution comprising of an N-containing compound and an organic substance in a mass ratio of 1:(0.5-150). The N-containing compound includes at least one of the followings: tetraalkylammonium hydroxide, ammonia, liquid ammonia, and a mixture...
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| Format: | Patent |
| Sprache: | eng |
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