On the origin and evolution of hotspots in multipatterning processes

Understanding the origins and propagation of defects and hotspots in patterning processes used for semiconductor fabrication is of paramount importance in managing yield. In this paper, results from physics-based simulators to model lithography and dry etch processes are presented and compared to ex...

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Veröffentlicht in:	Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2023-07, Vol.41 (4)
Hauptverfasser:	Panneerchelvam, Prem, Huard, Chad M., Graves, Trey, Pret, Alessandro Vaglio, Gronheid, Roel, Agarwal, Ankur, Smith, Mark D.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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