Method to create cuprate tunnel junctions with atomically sharp interfaces

Method to create cuprate tunnel junctions with atomically sharp interfaces

We present a method for producing tunnel junctions from cuprate thin films grown by atomic layer-by-layer molecular beam epitaxy (ALL-MBE). Our approach utilizes microfabrication processing and relies on the atomically precise interfaces provided by the ALL-MBE synthesis technique. The method is sui...

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Veröffentlicht in:Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2022-01, Vol.40 (1)
Hauptverfasser: Bollinger, Anthony T., He, Xi, Xu, Xiaotao, Shi, Xiaoyan, Božović, Ivan
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container_title Journal of vacuum science and technology. B, Nanotechnology & microelectronics
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creator Bollinger, Anthony T.
He, Xi
Xu, Xiaotao
Shi, Xiaoyan
Božović, Ivan
description We present a method for producing tunnel junctions from cuprate thin films grown by atomic layer-by-layer molecular beam epitaxy (ALL-MBE). Our approach utilizes microfabrication processing and relies on the atomically precise interfaces provided by the ALL-MBE synthesis technique. The method is suitable for a wide range of junction dimensions and materials and allows for more complex designs such as superconducting quantum interference devices and junction arrays. Fully superconducting electrodes ensure that the contact resistances in the devices created by this method remain very low.
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title Method to create cuprate tunnel junctions with atomically sharp interfaces
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