Plasma-assisted molecular beam epitaxy for ZnO based II–VI semiconductor oxides and their heterostructures

Plasma-assisted molecular beam epitaxy of ZnO epilayers and MgZnO/ZnO heterostructures on Al 2 O 3 (0001) substrates is described. A thin MgO layer is employed as a buffer for ZnO. The influence of the buffer on the initial growth of ZnO is discussed with the corresponding reflection high-energy ele...

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Veröffentlicht in:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2000-05, Vol.18 (3), p.1514-1517
Hauptverfasser: Chen, Yefan, Ko, Hang-ju, Hong, Soon-ku, Sekiuchi, Takashi, Yao, Takafumi, Segawa, Yusaburo
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container_issue 3
container_start_page 1514
container_title Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
container_volume 18
creator Chen, Yefan
Ko, Hang-ju
Hong, Soon-ku
Sekiuchi, Takashi
Yao, Takafumi
Segawa, Yusaburo
description Plasma-assisted molecular beam epitaxy of ZnO epilayers and MgZnO/ZnO heterostructures on Al 2 O 3 (0001) substrates is described. A thin MgO layer is employed as a buffer for ZnO. The influence of the buffer on the initial growth of ZnO is discussed with the corresponding reflection high-energy electron diffraction (RHEED) studies. We found that the MgO buffer promotes the lateral growth of ZnO, which results in two-dimensional growth. A 3×3 reconstruction is observed and the RHEED intensity oscillations are recorded. The RHEED oscillations have been used in situ to monitor and control the growth of MgZnO/ZnO heterostructures. MgZnO/ZnO single-quantum-well structures have been grown and studied by cathodoluminescence.
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1071-1023
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subjects Cathodoluminescence
Heterojunctions
Image reconstruction
Molecular beam epitaxy
Morphology
Nucleation
Plasma oscillations
Reflection high energy electron diffraction
Semiconducting zinc compounds
Semiconductor growth
title Plasma-assisted molecular beam epitaxy for ZnO based II–VI semiconductor oxides and their heterostructures
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