Temperature and oxygen concentration effects on anisotropy in chromium hard mask etching for nanoscale fabrication

Chromium and its oxides are valuable as functional materials and plasma-etching hard masks in micro- and nanofabrication. While the continuous decrease in feature sizes opens new opportunities for applications of patterned chromium, the demands placed on the patterning process require a new level of...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2019-11, Vol.37 (6)
Hauptverfasser:	Staaks, Daniel, Yu, Zhaoning, Dhuey, Scott D., Sassolini, Simone, Lee, Kim Y., Rangelow, Ivo W., Olynick, Deirdre L.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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