Extending the compositional diversity of films in area selective atomic layer deposition through chemical functionalities

As the semiconductor community continues scaling, area selective atomic layer deposition (ASD) offers the potential to relax down stream processing steps by enabling self-aligned processes (e.g., self-aligned vias). Otherwise, conventional means of lithography face increasingly difficult challenges...

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Veröffentlicht in:	Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2019-03, Vol.37 (2)
Hauptverfasser:	Mettry, Magi, Hess, Alexander E., Goetting, Isabella, Arellano, Noel, Friz, Alexander, Tek, Andy, Wojtecki, Rudy J.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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