In situ femtosecond pulse laser ablation for large volume 3D analysis in scanning electron microscope systems

In situ femtosecond pulse laser ablation for large volume 3D analysis in scanning electron microscope systems

The authors have developed a system combining a 220 fs pulse focused laser beam operating at 1030 or 515 nm, a Xe+ plasma source focused ion beam, and a Schottky source focused electron beam, all coincident at the sample. They present on results and applications for in situ micro device characteriza...

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Veröffentlicht in:Journal of vacuum science and technology. B, Nanotechnology & microelectronics Nanotechnology & microelectronics, 2018-11, Vol.36 (6)
Hauptverfasser: Randolph, Steven Jeffrey, Filevich, Jorge, Botman, Aurelien, Gannon, Renae, Rue, Chad, Straw, Marcus
Format: Artikel
Sprache:eng
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Zusammenfassung:The authors have developed a system combining a 220 fs pulse focused laser beam operating at 1030 or 515 nm, a Xe+ plasma source focused ion beam, and a Schottky source focused electron beam, all coincident at the sample. They present on results and applications for in situ micro device characterization and large volume 3D analysis.
ISSN:2166-2746
2166-2754
DOI:10.1116/1.5047806