Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study

The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by A...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Journal of vacuum science & technology. A, Vacuum, surfaces, and films Vacuum, surfaces, and films, 2018-01, Vol.36 (1)
Hauptverfasser: Kot, Małgorzata, Łobaza, Justyna, Naumann, Franziska, Gargouri, Hassan, Henkel, Karsten, Schmeißer, Dieter
Format: Artikel
Sprache:eng
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page
container_issue 1
container_start_page
container_title Journal of vacuum science & technology. A, Vacuum, surfaces, and films
container_volume 36
creator Kot, Małgorzata
Łobaza, Justyna
Naumann, Franziska
Gargouri, Hassan
Henkel, Karsten
Schmeißer, Dieter
description The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation.
doi_str_mv 10.1116/1.5003356
format Article
fullrecord <record><control><sourceid>scitation_cross</sourceid><recordid>TN_cdi_scitation_primary_10_1116_1_5003356</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>scitation_primary_10_1116_1_5003356</sourcerecordid><originalsourceid>FETCH-LOGICAL-c299t-4030ed148038215fd89e4448358c88dfd71d7db46c1e64ab0b93b8a5f423bb113</originalsourceid><addsrcrecordid>eNp9kM1KAzEYRYMoWKsL3yBbhanJJJlm3JXiHxQUVHA35FcjM8mQpOJsfXKntOhCcPXB5XC43wXgFKMZxri6wDOGECGs2gMTzEpUcMbqfTBBc0KLEiN8CI5SekcIlSWqJuBrFfxrkU3soOikMz7DtI5WKAPDp9Miu-BhsDC7LLxbd2M6eJej0wZa13YJ9tH0IhoN5QD7VqROFMa_Ca_GSOTQOQVbMZgItelDchvhJVx4-PLwCFNe6-EYHFjRJnOyu1PwfH31tLwtVvc3d8vFqlBlXeeCIoKMxpQjwkvMrOa1oZRywrjiXFs9x3quJa0UNhUVEsmaSC6YpSWREmMyBWdbr4ohpWhs00fXiTg0GDWb8Rrc7MYb2fMtm9T4-KbzD_wR4i_Y9Nr-B_81fwONh3-h</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype></control><display><type>article</type><title>Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study</title><source>AIP Journals Complete</source><source>Alma/SFX Local Collection</source><creator>Kot, Małgorzata ; Łobaza, Justyna ; Naumann, Franziska ; Gargouri, Hassan ; Henkel, Karsten ; Schmeißer, Dieter</creator><creatorcontrib>Kot, Małgorzata ; Łobaza, Justyna ; Naumann, Franziska ; Gargouri, Hassan ; Henkel, Karsten ; Schmeißer, Dieter</creatorcontrib><description>The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation.</description><identifier>ISSN: 0734-2101</identifier><identifier>EISSN: 1520-8559</identifier><identifier>DOI: 10.1116/1.5003356</identifier><identifier>CODEN: JVTAD6</identifier><language>eng</language><ispartof>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)</ispartof><rights>Author(s)</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c299t-4030ed148038215fd89e4448358c88dfd71d7db46c1e64ab0b93b8a5f423bb113</citedby><cites>FETCH-LOGICAL-c299t-4030ed148038215fd89e4448358c88dfd71d7db46c1e64ab0b93b8a5f423bb113</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,794,4510,27922,27923</link.rule.ids></links><search><creatorcontrib>Kot, Małgorzata</creatorcontrib><creatorcontrib>Łobaza, Justyna</creatorcontrib><creatorcontrib>Naumann, Franziska</creatorcontrib><creatorcontrib>Gargouri, Hassan</creatorcontrib><creatorcontrib>Henkel, Karsten</creatorcontrib><creatorcontrib>Schmeißer, Dieter</creatorcontrib><title>Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study</title><title>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</title><description>The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation.</description><issn>0734-2101</issn><issn>1520-8559</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2018</creationdate><recordtype>article</recordtype><recordid>eNp9kM1KAzEYRYMoWKsL3yBbhanJJJlm3JXiHxQUVHA35FcjM8mQpOJsfXKntOhCcPXB5XC43wXgFKMZxri6wDOGECGs2gMTzEpUcMbqfTBBc0KLEiN8CI5SekcIlSWqJuBrFfxrkU3soOikMz7DtI5WKAPDp9Miu-BhsDC7LLxbd2M6eJej0wZa13YJ9tH0IhoN5QD7VqROFMa_Ca_GSOTQOQVbMZgItelDchvhJVx4-PLwCFNe6-EYHFjRJnOyu1PwfH31tLwtVvc3d8vFqlBlXeeCIoKMxpQjwkvMrOa1oZRywrjiXFs9x3quJa0UNhUVEsmaSC6YpSWREmMyBWdbr4ohpWhs00fXiTg0GDWb8Rrc7MYb2fMtm9T4-KbzD_wR4i_Y9Nr-B_81fwONh3-h</recordid><startdate>201801</startdate><enddate>201801</enddate><creator>Kot, Małgorzata</creator><creator>Łobaza, Justyna</creator><creator>Naumann, Franziska</creator><creator>Gargouri, Hassan</creator><creator>Henkel, Karsten</creator><creator>Schmeißer, Dieter</creator><scope>AAYXX</scope><scope>CITATION</scope></search><sort><creationdate>201801</creationdate><title>Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study</title><author>Kot, Małgorzata ; Łobaza, Justyna ; Naumann, Franziska ; Gargouri, Hassan ; Henkel, Karsten ; Schmeißer, Dieter</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c299t-4030ed148038215fd89e4448358c88dfd71d7db46c1e64ab0b93b8a5f423bb113</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2018</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Kot, Małgorzata</creatorcontrib><creatorcontrib>Łobaza, Justyna</creatorcontrib><creatorcontrib>Naumann, Franziska</creatorcontrib><creatorcontrib>Gargouri, Hassan</creatorcontrib><creatorcontrib>Henkel, Karsten</creatorcontrib><creatorcontrib>Schmeißer, Dieter</creatorcontrib><collection>CrossRef</collection><jtitle>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Kot, Małgorzata</au><au>Łobaza, Justyna</au><au>Naumann, Franziska</au><au>Gargouri, Hassan</au><au>Henkel, Karsten</au><au>Schmeißer, Dieter</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study</atitle><jtitle>Journal of vacuum science &amp; technology. A, Vacuum, surfaces, and films</jtitle><date>2018-01</date><risdate>2018</risdate><volume>36</volume><issue>1</issue><issn>0734-2101</issn><eissn>1520-8559</eissn><coden>JVTAD6</coden><abstract>The surface oxidation of a titanium oxynitride (TiOxNy) film after long-time storage of 25 month in ambient conditions is investigated. The TiOxNy film is prepared by plasma-enhanced atomic layer deposition using tetrakis(dimethylamino)titanium and nitrogen plasma, and the film is characterized by Ar+ ion sputtering of the film surface in combination with x-ray photoelectron spectroscopy (XPS) as well as by angle-resolved XPS. The total thickness of an oxygen-enriched layer at the surface of the TiOxNy films is found to be about 0.7 nm and it consists of a sequence of a 0.4 nm thick TiON/TiO2 enriched layer followed by a 0.3 nm thick TiO2 enriched layer underneath compared to the bulk composition of the film which shows constant values of 29% TiN, 29% TiO2, and 42% TiON. The results suggest that the TiON enrichment takes place initially at the surface followed by a surface and subsurface oxidation.</abstract><doi>10.1116/1.5003356</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0734-2101
ispartof Journal of vacuum science & technology. A, Vacuum, surfaces, and films, 2018-01, Vol.36 (1)
issn 0734-2101
1520-8559
language eng
recordid cdi_scitation_primary_10_1116_1_5003356
source AIP Journals Complete; Alma/SFX Local Collection
title Long-term ambient surface oxidation of titanium oxynitride films prepared by plasma-enhanced atomic layer deposition: An XPS study
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-09T14%3A53%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-scitation_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Long-term%20ambient%20surface%20oxidation%20of%20titanium%20oxynitride%20films%20prepared%20by%20plasma-enhanced%20atomic%20layer%20deposition:%20An%20XPS%20study&rft.jtitle=Journal%20of%20vacuum%20science%20&%20technology.%20A,%20Vacuum,%20surfaces,%20and%20films&rft.au=Kot,%20Ma%C5%82gorzata&rft.date=2018-01&rft.volume=36&rft.issue=1&rft.issn=0734-2101&rft.eissn=1520-8559&rft.coden=JVTAD6&rft_id=info:doi/10.1116/1.5003356&rft_dat=%3Cscitation_cross%3Escitation_primary_10_1116_1_5003356%3C/scitation_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true